At ICMOVPE XXI, AIST in Collaboration with Taiyo Nippon Sanso will present on Accelerated Raw-Material Utilization-Efficiency of GaAs Using Vertical Flow Type, Single-Chamber Hydride Vapor Phase Epitaxy, May 12th-17th

At ICMOVPE XXI, AIST in Collaboration with Taiyo Nippon Sanso will present on“Accelerated Raw-Material Utilization-Efficiency of GaAs Using Vertical Flow Type, Single-Chamber Hydride Vapor Phase Epitaxy,” Ryuji Oshima¹ , Guanxi Piao² , Yasushi Shoji¹ , Kikuo Makita¹, Akinori Ubukata², Shuichi Koseki² and Takeyoshi Sugaya¹ ; 

¹National Institute of Advanced Industrial Science and Technology, Japan; ²Taiyo Nippon Sanso, Japan